Chemical Engineering May 2010 - 39

Moyno
Revise #1 - 2/4/10
6:00 PM
Centrifuge & Drying
Technologies
Inverting Filter Centrifuge
Cutting edge centrifuge technology for
fi ltration, washing and drying of solid/liquid
Magnetic-drive pump provides a
'zero-leakage' option for operators
The Moyno Mag Drive 500 Series pumps
(photo) are said to be the first progessing-cavity,
wobble-stator pumps to offer
magnetic drives. They are designed to
handle toxic, aggressive, caustic or even
flammable and explosive fluids. This
proprietary mag-drive pump is designed
to maximize operator safety, eliminate
workplace hazards and protect the
environment by eliminating leakage
pathways. The elimination of mechanical
seals also helps to eliminate costly
repairs. Four models are available, providing
flowrates from 0.1 to 900 gal/h.
- Moyno, Inc., Springfield, Ohio
www.moyno.com
This incremental encoder can
handle harsh environments
The Sendix 5006 2-in. incremental encoder
features a completely stainlesssteel
housing and Viton seals to resist
corrosion and physical abuse in harsh
plant environments. The encoder can
handle fluctuations in temperature,
from -40 to 85°C, and is IP67-rated
when sealed. The Sendix 5006 incorporates
a proprietary Safety-Lock bearing
assembly that has been tested to provide
additional protection against vibration
and installation errors. It is ideal for use
in corrosive environments or for applications
requiring long-term durability.
- Turck Inc., Plymouth, Minn.
www.turck.us
Deposit low-friction coatings
with this system
The AL400 system is a new plasmaenhanced,
chemical-vapor-deposition
(PECVD)
instrument designed for the
deposition of a smooth coating on rubber
and elastomeric surfaces. The lowcoefficient-of-friction
coating reduces
tackiness and drag of rubber and
elastomeric surfaces, and can repel
lint and other contaminants on silicone
components. Coating thickness
is typically less than one micron, and
has no effect on the bulk properties
of the coated material. The PECVD
system is clean-room compatible and
available in a table-top version or with
a free-standing enclosure. - Plasmatech
Inc., Erlanger, Ky.
www.plasmatechnology.com
This sifter allows quick screen
changeouts
The CS-1 gyratory sifter is a stackeddeck
sifter designed to save time and
labor in screen changes. Screen inserts
can be switched within minutes using
only standard hand tools, without the
need for glues or tensioning machines.
The CS-1 provides two to four separations
of dry product from ¼ in. size
down to 400 mesh with a capacity of
50,000 lb/h. - Sifter Parts and Service
Inc., Wesley Chapel, Fla.
www.sifterparts.com
Protect sensitive instruments
with this gas cylinder
The Ecocyl OSQ specialty gas cylinder
uses a unique form of negative
gas pressure to protect sensitive instruments,
suspensions

Widest range of applications - hardest to
easiest fi ltering products can be handled
 No residual heel for exact repeatable
batches and no loss of product
 Full containment eliminates operator
exposure
 Effective automated CIP
Kilo-Lab Conical
Vacuum Dryer-Mixer
Advanced technology
for real Kilo size
drying research
and development
 Utilizes interchangeable agitator systems
either orbiting arm screw or central shaft
 Flexible small scale volume of 150ml to
1500ml
 Plastic view through vessel available
 Designed for real laboratory requirements
of size, with full instrument & data
recording
 Direct scale up to production or pilot size
units
Horizontal & Vertical
Centrifuges
such as environmental
monitoring devices, from damage due
to positive gas pressure, which can be
associated with conventional gas cylinders.
The on-demand, stainless-steel
cylinder is refillable, and has an integrated
cylinder valve, pressure regulator
and flow control device, which are
permanently protected by a specially
designed protective cowling. The new
cylinder is suited to instruments such
ChemiCal engineering www.Che.Com may 2010 32D-7
Lab Testing Available
Rental & Lease Machines Available
www.heinkelusa.com
Tel: 856-467-3399
Circle 25 on p. 70 or go to adlinks.che.com/29250-25
 Size ranges from 200mm to 1800mm
 Wide range of standard & custom designs
 Laboratory size equipment
 PAC® technology allows drying of the
product inside of the centrifuge
 Thin cake fi ltration operation allows for
improved quality and production rates
http://www.plasmatechnology.com http://www.moyno.com http://www.sifterparts.com http://www.turck.us http://www.heinkelusa.com http://adlinks.che.com/29250-25 http://www.Che.Com

Chemical Engineering May 2010

Table of Contents for the Digital Edition of Chemical Engineering May 2010

Contents
Chemical Engineering May 2010 - Cover1
Chemical Engineering May 2010 - Cover2
Chemical Engineering May 2010 - Contents
Chemical Engineering May 2010 - 2
Chemical Engineering May 2010 - 3
Chemical Engineering May 2010 - 4
Chemical Engineering May 2010 - 5
Chemical Engineering May 2010 - 6
Chemical Engineering May 2010 - 7
Chemical Engineering May 2010 - 8
Chemical Engineering May 2010 - 9
Chemical Engineering May 2010 - 10
Chemical Engineering May 2010 - 11
Chemical Engineering May 2010 - 12
Chemical Engineering May 2010 - 13
Chemical Engineering May 2010 - 14
Chemical Engineering May 2010 - 15
Chemical Engineering May 2010 - 16
Chemical Engineering May 2010 - 17
Chemical Engineering May 2010 - 18
Chemical Engineering May 2010 - 19
Chemical Engineering May 2010 - 20
Chemical Engineering May 2010 - 21
Chemical Engineering May 2010 - 22
Chemical Engineering May 2010 - 23
Chemical Engineering May 2010 - 24
Chemical Engineering May 2010 - 25
Chemical Engineering May 2010 - 26
Chemical Engineering May 2010 - 27
Chemical Engineering May 2010 - 28
Chemical Engineering May 2010 - 29
Chemical Engineering May 2010 - 30
Chemical Engineering May 2010 - 31
Chemical Engineering May 2010 - 32
Chemical Engineering May 2010 - 33
Chemical Engineering May 2010 - 34
Chemical Engineering May 2010 - 35
Chemical Engineering May 2010 - 36
Chemical Engineering May 2010 - 37
Chemical Engineering May 2010 - 38
Chemical Engineering May 2010 - 39
Chemical Engineering May 2010 - 40
Chemical Engineering May 2010 - 41
Chemical Engineering May 2010 - 42
Chemical Engineering May 2010 - 43
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Chemical Engineering May 2010 - 46
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Chemical Engineering May 2010 - 80
Chemical Engineering May 2010 - Cover3
Chemical Engineering May 2010 - Cover4
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